Griep, G.; Bovadilla, R.G.; Gomes, L.G.; Cartagena, L.Q.; Rehder, G.P.; Serrano, A.L.C.
2D and 3D Interdigital Capacitors and Bias Tees Technologies on MnM Interposer for mmWave Applications. Micromachines 2026, 17, 274.
https://doi.org/10.3390/mi17020274
AMA Style
Griep G, Bovadilla RG, Gomes LG, Cartagena LQ, Rehder GP, Serrano ALC.
2D and 3D Interdigital Capacitors and Bias Tees Technologies on MnM Interposer for mmWave Applications. Micromachines. 2026; 17(2):274.
https://doi.org/10.3390/mi17020274
Chicago/Turabian Style
Griep, Gabriel, Robert G. Bovadilla, Leonardo G. Gomes, LuÃs Q. Cartagena, Gustavo P. Rehder, and Ariana L. C. Serrano.
2026. "2D and 3D Interdigital Capacitors and Bias Tees Technologies on MnM Interposer for mmWave Applications" Micromachines 17, no. 2: 274.
https://doi.org/10.3390/mi17020274
APA Style
Griep, G., Bovadilla, R. G., Gomes, L. G., Cartagena, L. Q., Rehder, G. P., & Serrano, A. L. C.
(2026). 2D and 3D Interdigital Capacitors and Bias Tees Technologies on MnM Interposer for mmWave Applications. Micromachines, 17(2), 274.
https://doi.org/10.3390/mi17020274