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Open AccessArticle
Near-Field Electrospray ZnO Thin Film for Ultraviolet Photodetectors
by
Liyun Zhuo
Liyun Zhuo 1,2,
Tao Peng
Tao Peng 3,
Jiaxin Jiang
Jiaxin Jiang 3,* and
Gaofeng Zheng
Gaofeng Zheng 4,*
1
The Higher Educational Key Laboratory for Flexible Manufacturing Equipment Integration of Fujian Province, Xiamen Institute of Technology, Xiamen 361021, China
2
School of Mechanical, Electrical and Information Engineering, Xiamen Institute of Technology, Xiamen 361021, China
3
School of Mechanical and Automotive Engineering, Xiamen University of Technology, Xiamen 361024, China
4
Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen 361102, China
*
Authors to whom correspondence should be addressed.
Micromachines 2026, 17(1), 69; https://doi.org/10.3390/mi17010069 (registering DOI)
Submission received: 1 December 2025
/
Revised: 25 December 2025
/
Accepted: 30 December 2025
/
Published: 31 December 2025
Abstract
ZnO thin-film ultraviolet photodetectors are widely used in the military, space, environmental protection, medicine, and other fields. Accurate printing of ZnO photoelectric-sensitive films plays a key role in the detection results. Therefore, obtaining printing technology with a simple process and high precision has become a challenge for ZnO photoelectrically sensitive films. By adjusting the distance between the nozzle and the collecting plate, the jet is atomized in a straight line and deposited directly on the collecting plate, which effectively improves the stability and controllability of the jet spraying and deposition processes. ZnO thin films with a uniform distribution of nanoparticles, significantly improved density, and controllable deposition area linewidth were successfully prepared. The effects of different ZnO film structures on the performance of ultraviolet photodetectors were tested. When the ultraviolet light intensity is 500, 1000, and 2500 mW/cm2, the Ilight of the photodetector is 4.62, 9.38, 14.67 mA, The on/off ratio (Ilight / Idark) is 20.7, 42.1, 65.8, implying satisfactory photoelectric performance as well as high stability and repeatability, providing an effective technical means for the precise printing application of micro-nano functional devices.
Share and Cite
MDPI and ACS Style
Zhuo, L.; Peng, T.; Jiang, J.; Zheng, G.
Near-Field Electrospray ZnO Thin Film for Ultraviolet Photodetectors. Micromachines 2026, 17, 69.
https://doi.org/10.3390/mi17010069
AMA Style
Zhuo L, Peng T, Jiang J, Zheng G.
Near-Field Electrospray ZnO Thin Film for Ultraviolet Photodetectors. Micromachines. 2026; 17(1):69.
https://doi.org/10.3390/mi17010069
Chicago/Turabian Style
Zhuo, Liyun, Tao Peng, Jiaxin Jiang, and Gaofeng Zheng.
2026. "Near-Field Electrospray ZnO Thin Film for Ultraviolet Photodetectors" Micromachines 17, no. 1: 69.
https://doi.org/10.3390/mi17010069
APA Style
Zhuo, L., Peng, T., Jiang, J., & Zheng, G.
(2026). Near-Field Electrospray ZnO Thin Film for Ultraviolet Photodetectors. Micromachines, 17(1), 69.
https://doi.org/10.3390/mi17010069
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