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Journal: Micromachines, 2025
Volume: 16
Number: 958
Article:
Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure
Authors:
by
Mukhit Muratov, Yana Shabelnikova, Sergey Zaitsev, Renata Nemkayeva and Nazim Guseinov
Link:
https://www.mdpi.com/2072-666X/16/8/958
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