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Journal: Micromachines, 2025
Volume: 16
Number: 442
Article:
Low-Pressure Chemical Vapor Deposition SiNx Process Study and Its Impact on Interface Characteristics of AlGaN/GaN MISHEMTs
Authors:
by
Hu Sun, Qian Fan, Xianfeng Ni, Qiang Luo and Xing Gu
Link:
https://www.mdpi.com/2072-666X/16/4/442
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