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Journal: Micromachines, 2025
Volume: 16
Number: 1166

Article: Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source–Mask Optimization
Authors: by Qi Wang, Qiang Wu, Ying Li, Xianhe Liu and Yanli Li
Link: https://www.mdpi.com/2072-666X/16/10/1166

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