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Journal: Micromachines, 2025
Volume: 16
Number: 1166
Article:
Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source–Mask Optimization
Authors:
by
Qi Wang, Qiang Wu, Ying Li, Xianhe Liu and Yanli Li
Link:
https://www.mdpi.com/2072-666X/16/10/1166
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