Xia, L.; Lei, H.; Dong, E.; Chang, T.; Zhao, L.; Chen, M.; Lu, J.; Cheng, J.
Achieving High-Quality Formed Hastelloy X Cladding Layers on Heterological 50CrVA Surface by Optimizing Process Parameters in Directed Energy Deposition. Micromachines 2025, 16, 1110.
https://doi.org/10.3390/mi16101110
AMA Style
Xia L, Lei H, Dong E, Chang T, Zhao L, Chen M, Lu J, Cheng J.
Achieving High-Quality Formed Hastelloy X Cladding Layers on Heterological 50CrVA Surface by Optimizing Process Parameters in Directed Energy Deposition. Micromachines. 2025; 16(10):1110.
https://doi.org/10.3390/mi16101110
Chicago/Turabian Style
Xia, Liming, Hongqin Lei, Enjie Dong, Tingyu Chang, Linjie Zhao, Mingjun Chen, Junwen Lu, and Jian Cheng.
2025. "Achieving High-Quality Formed Hastelloy X Cladding Layers on Heterological 50CrVA Surface by Optimizing Process Parameters in Directed Energy Deposition" Micromachines 16, no. 10: 1110.
https://doi.org/10.3390/mi16101110
APA Style
Xia, L., Lei, H., Dong, E., Chang, T., Zhao, L., Chen, M., Lu, J., & Cheng, J.
(2025). Achieving High-Quality Formed Hastelloy X Cladding Layers on Heterological 50CrVA Surface by Optimizing Process Parameters in Directed Energy Deposition. Micromachines, 16(10), 1110.
https://doi.org/10.3390/mi16101110
