Order Article Reprints

Tyaginov S, O’Sullivan B, Chasin A, Rawal Y, Chiarella T, de Carvalho Cavalcante CT, Kimura Y, Vandemaele M, Ritzenthaler R, Mitard J, et al. Impact of Nitridation on Bias Temperature Instability and Hard Breakdown Characteristics of SiON MOSFETs. Micromachines. 2023; 14(8):1514. https://doi.org/10.3390/mi14081514

Tyaginov, Stanislav, Barry O’Sullivan, Adrian Chasin, Yaksh Rawal, Thomas Chiarella, Camila Toledo de Carvalho Cavalcante, Yosuke Kimura, Michiel Vandemaele, Romain Ritzenthaler, Jerome Mitard, and et al. 2023. "Impact of Nitridation on Bias Temperature Instability and Hard Breakdown Characteristics of SiON MOSFETs" Micromachines 14, no. 8: 1514. https://doi.org/10.3390/mi14081514

Tyaginov, S., O’Sullivan, B., Chasin, A., Rawal, Y., Chiarella, T., de Carvalho Cavalcante, C. T., Kimura, Y., Vandemaele, M., Ritzenthaler, R., Mitard, J., Palayam, S. V., Reifsnider, J., & Kaczer, B. (2023). Impact of Nitridation on Bias Temperature Instability and Hard Breakdown Characteristics of SiON MOSFETs. Micromachines, 14(8), 1514. https://doi.org/10.3390/mi14081514