Cai, X.; Ji, C.; Li, C.; Tian, Z.; Wang, X.; Lei, C.; Liu, S.
Multiphoton Absorption Simulation of Sapphire Substrate under the Action of Femtosecond Laser for Larger Density of Pattern-Related Process Windows. Micromachines 2021, 12, 1571.
https://doi.org/10.3390/mi12121571
AMA Style
Cai X, Ji C, Li C, Tian Z, Wang X, Lei C, Liu S.
Multiphoton Absorption Simulation of Sapphire Substrate under the Action of Femtosecond Laser for Larger Density of Pattern-Related Process Windows. Micromachines. 2021; 12(12):1571.
https://doi.org/10.3390/mi12121571
Chicago/Turabian Style
Cai, Xintian, Chaoyue Ji, Changkai Li, Zhiqiang Tian, Xuan Wang, Cheng Lei, and Sheng Liu.
2021. "Multiphoton Absorption Simulation of Sapphire Substrate under the Action of Femtosecond Laser for Larger Density of Pattern-Related Process Windows" Micromachines 12, no. 12: 1571.
https://doi.org/10.3390/mi12121571
APA Style
Cai, X., Ji, C., Li, C., Tian, Z., Wang, X., Lei, C., & Liu, S.
(2021). Multiphoton Absorption Simulation of Sapphire Substrate under the Action of Femtosecond Laser for Larger Density of Pattern-Related Process Windows. Micromachines, 12(12), 1571.
https://doi.org/10.3390/mi12121571
