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Optical Detection Method for High Aspect Ratio Microstructures

National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
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Micromachines 2020, 11(3), 296; https://doi.org/10.3390/mi11030296
Received: 17 January 2020 / Revised: 6 March 2020 / Accepted: 10 March 2020 / Published: 11 March 2020
(This article belongs to the Section A:Physics)
High aspect ratio microstructures (HARMS) are of great importance for many application fields. Many defects are generated during the fabrication processes, especially in line microstructures, and it is necessary to examine the quality of the structures after each process. However, there is no suitable efficient nondestructive detection method to monitor microstructures during the fabrication processes. In this paper, an optical detection method capable of detecting the structures by analyzing the reflection of light on the line HARMS is proposed. According to the image of reflected visible light, this method can determine whether there are defects in structures, so as to realize efficient detection. Preliminary simulations and experiments have been performed to confirm the feasibility and validity of the proposed method for detecting line microstructures. This method is expected to obtain more information about microstructures by further optimizing system parameters. View Full-Text
Keywords: optical detection; UV-LIGA; high aspect ratio; microstructures optical detection; UV-LIGA; high aspect ratio; microstructures
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MDPI and ACS Style

Wei, W.; Hou, S.; Wu, Z.; Hu, Y.; Wang, Y.; Chen, L.; Xiong, Y.; Tian, Y.; Liu, G. Optical Detection Method for High Aspect Ratio Microstructures. Micromachines 2020, 11, 296.

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