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Open AccessArticle

Measuring Ocular Aberrations Sequentially Using a Digital Micromirror Device

Advanced Optical Imaging Group, School of Physics, University College Dublin, Dublin D04, Ireland
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Micromachines 2019, 10(2), 117; https://doi.org/10.3390/mi10020117
Received: 5 January 2019 / Revised: 25 January 2019 / Accepted: 8 February 2019 / Published: 12 February 2019
(This article belongs to the Special Issue Optical MEMS)
The Hartmann–Shack wavefront sensor is widely used to measure aberrations in both astronomy and ophthalmology. Yet, the dynamic range of the sensor is limited by cross-talk between adjacent lenslets. In this study, we explore ocular aberration measurements with a recently-proposed variant of the sensor that makes use of a digital micromirror device for sequential aperture scanning of the pupil, thereby avoiding the use of a lenslet array. We report on results with the sensor using two different detectors, a lateral position sensor and a charge-coupled device (CCD) scientific camera, and explore the pros and cons of both. Wavefront measurements of a highly aberrated artificial eye and of five real eyes, including a highly myopic subject, are demonstrated, and the role of pupil sampling density, CCD pixel binning, and scanning speed are explored. We find that the lateral position sensor is mostly suited for high-power applications, whereas the CCD camera with pixel binning performs consistently well both with the artificial eye and for real-eye measurements, and can outperform a commonly-used wavefront sensor with highly aberrated wavefronts. View Full-Text
Keywords: wavefront sensing; digital micromirror device; ocular aberrations wavefront sensing; digital micromirror device; ocular aberrations
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Carmichael Martins, A.; Vohnsen, B. Measuring Ocular Aberrations Sequentially Using a Digital Micromirror Device. Micromachines 2019, 10, 117.

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