Next Article in Journal
Modeling of Knudsen Layer Effects in the Micro-Scale Backward-Facing Step in the Slip Flow Regime
Previous Article in Journal
Microfluidic High-Migratory Cell Collector Suppressing Artifacts Caused by Microstructures
Previous Article in Special Issue
Multiple Laser Stripe Scanning Profilometry Based on Microelectromechanical Systems Scanning Mirror Projection
Article Menu

Export Article

Open AccessArticle
Micromachines 2019, 10(2), 117;

Measuring Ocular Aberrations Sequentially Using a Digital Micromirror Device

Advanced Optical Imaging Group, School of Physics, University College Dublin, Dublin D04, Ireland
Author to whom correspondence should be addressed.
Received: 5 January 2019 / Revised: 25 January 2019 / Accepted: 8 February 2019 / Published: 12 February 2019
(This article belongs to the Special Issue Optical MEMS)
Full-Text   |   PDF [1652 KB, uploaded 12 February 2019]   |  


The Hartmann–Shack wavefront sensor is widely used to measure aberrations in both astronomy and ophthalmology. Yet, the dynamic range of the sensor is limited by cross-talk between adjacent lenslets. In this study, we explore ocular aberration measurements with a recently-proposed variant of the sensor that makes use of a digital micromirror device for sequential aperture scanning of the pupil, thereby avoiding the use of a lenslet array. We report on results with the sensor using two different detectors, a lateral position sensor and a charge-coupled device (CCD) scientific camera, and explore the pros and cons of both. Wavefront measurements of a highly aberrated artificial eye and of five real eyes, including a highly myopic subject, are demonstrated, and the role of pupil sampling density, CCD pixel binning, and scanning speed are explored. We find that the lateral position sensor is mostly suited for high-power applications, whereas the CCD camera with pixel binning performs consistently well both with the artificial eye and for real-eye measurements, and can outperform a commonly-used wavefront sensor with highly aberrated wavefronts. View Full-Text
Keywords: wavefront sensing; digital micromirror device; ocular aberrations wavefront sensing; digital micromirror device; ocular aberrations

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Carmichael Martins, A.; Vohnsen, B. Measuring Ocular Aberrations Sequentially Using a Digital Micromirror Device. Micromachines 2019, 10, 117.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top