Fu, C.; Zhou, X.; Wang, Y.; Xu, P.; Xu, M.; Wu, D.; Luo, J.; Zhao, C.; Zhang, S.-L.
Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing. Materials 2016, 9, 315.
https://doi.org/10.3390/ma9050315
AMA Style
Fu C, Zhou X, Wang Y, Xu P, Xu M, Wu D, Luo J, Zhao C, Zhang S-L.
Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing. Materials. 2016; 9(5):315.
https://doi.org/10.3390/ma9050315
Chicago/Turabian Style
Fu, Chaochao, Xiangbiao Zhou, Yan Wang, Peng Xu, Ming Xu, Dongping Wu, Jun Luo, Chao Zhao, and Shi-Li Zhang.
2016. "Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing" Materials 9, no. 5: 315.
https://doi.org/10.3390/ma9050315
APA Style
Fu, C., Zhou, X., Wang, Y., Xu, P., Xu, M., Wu, D., Luo, J., Zhao, C., & Zhang, S.-L.
(2016). Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing. Materials, 9(5), 315.
https://doi.org/10.3390/ma9050315