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Journal: Materials, 2015
Volume: 8
Number: 5425
Article:
Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
Authors:
by
Stephan Ratzsch, Ernst-Bernhard Kley, Andreas Tünnermann and Adriana Szeghalmi
Link:
https://www.mdpi.com/1996-1944/8/11/5425
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