Next Article in Journal
Large-Scale Synthesis of Carbon Nanomaterials by Catalytic Chemical Vapor Deposition: A Review of the Effects of Synthesis Parameters and Magnetic Properties
Next Article in Special Issue
Creating Surface Properties Using a Palette of Hydrophobins
Previous Article in Journal
Emission Properties, Solubility, Thermodynamic Analysis and NMR Studies of Rare-Earth Complexes with Two Different Phosphine Oxides
Previous Article in Special Issue
Functional Coatings or Films for Hard-Tissue Applications
Open AccessReview

Thin Film Deposition Using Energetic Ions

Leibniz-Institut für Oberflächenmodifizierung, Permoserstr. 15, 04318 Leipzig, Germany
*
Author to whom correspondence should be addressed.
Materials 2010, 3(8), 4109-4141; https://doi.org/10.3390/ma3084109
Received: 12 June 2010 / Revised: 7 July 2010 / Accepted: 27 July 2010 / Published: 29 July 2010
(This article belongs to the Special Issue Advances in Surface Coatings)
One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes. View Full-Text
Keywords: PVD; thin films; ion assisted deposition; ion implantation; nanostructures PVD; thin films; ion assisted deposition; ion implantation; nanostructures
Show Figures

Figure 1

MDPI and ACS Style

Manova, D.; Gerlach, J.W.; Mändl, S. Thin Film Deposition Using Energetic Ions. Materials 2010, 3, 4109-4141.

Show more citation formats Show less citations formats

Article Access Map by Country/Region

1
Only visits after 24 November 2015 are recorded.
Back to TopTop