Van Der Waals Ferroionic CuInP2S6: Emergent Properties and Device Application
Abstract
1. Introduction
2. The Crystal Structure and Ferroelectricity
2.1. Origin of Ferroelectricity
2.2. Evidence of In-Plane/Out-of-Plane Polarization
2.3. Thickness-Dependent Phase Transition and In-Plane Polarization
3. Chemical Composition Engineering and Emerging Properties
3.1. Chemical Composition Engineering
3.2. Emerging Properties
4. Ferroionic Coupling and Its Modulation by External Fields
4.1. The Concept of Ferroionic Coupling
4.2. The Experimental Evidence of Cu Ion Migration
4.3. Polarization Switching Dynamics Under Diverse External Fields
5. Dynamic Current Response and Conductive Mechanism
6. Emerging Nanoelectronics Based on CIPS Ferroelectrics
| Device Structure | Type | Reference | Dominant Mechanism |
|---|---|---|---|
| Cr/CIPS/graphene vdW | Ferroelectric tunnel junction | Wu et al. [115] | Ferroelectric switching |
| graphite/CIPS/MoS2/h-BN | Three-terminal memory | Li et al. [42] | Ferroelectric switching |
| graphite/CIPS/graphite | Bulk photovoltaic device | Li et al. [134] | Ferroelectric switching |
| graphite/CIPS/graphite | Photovoltaic device | Liang et al. [50] | Strong ferroelectric-ionic coupling |
| Pt/CIPS/Gr | Optoelectronic synaptic device | Men et al. [135] | Strong ferroelectric-ionic coupling |
| Au/CIPS/Au | Artificial synapse | Ci et al. [39] | Strong ferroelectric-ionic coupling |
| a MoS2 FET + a CIPS TS | Threshold switching transistor | Baek et al. [133] | Ion migration-dominated |
| Au/CIPS/Au | Reconfigurable logic device | Zhong et al. [88] | Ion migration-dominated |
| Cr/CIPS/Au | Lateral two-terminal CIPS memristor | Chen et al. [14] | Ion migration-dominated |
| graphite/CIPS/graphite | Ionic CIPS memristor | Sun et al. [26] | Ion migration-dominated |
| graphene/CIPS/Au | Optoelectronic synapse | Liu et al. [136] | Ion migration-dominated |
7. Challenges and Outlook
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
References
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| Composition | Thickness | Substrate | Structure | OP | IP | Measurement | Reference |
|---|---|---|---|---|---|---|---|
| − | >100 nm | heavily doped silicon | Monoclinic Cc (No. 9) | √ | √ | Vector-PFM | [61] |
| − | <100 nm | heavily doped silicon | Trigonal (P31c) | √ | × | Vector-PFM | [61] |
| Cu0.9In0.99P2S5.9 | 8–200 nm | Au-covered silicon | Monoclinic Cc (No. 9) | √ | √ | Vector-PFM | [38] |
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Li, M.; Peng, Z.; Zhang, D.; Wang, X.; Yang, W.; Liang, Z.; Jiang, X. Van Der Waals Ferroionic CuInP2S6: Emergent Properties and Device Application. Materials 2026, 19, 1586. https://doi.org/10.3390/ma19081586
Li M, Peng Z, Zhang D, Wang X, Yang W, Liang Z, Jiang X. Van Der Waals Ferroionic CuInP2S6: Emergent Properties and Device Application. Materials. 2026; 19(8):1586. https://doi.org/10.3390/ma19081586
Chicago/Turabian StyleLi, Muzhi, Zhuoyin Peng, Dongdong Zhang, Xueyun Wang, Weiyou Yang, Zhao Liang, and Xingan Jiang. 2026. "Van Der Waals Ferroionic CuInP2S6: Emergent Properties and Device Application" Materials 19, no. 8: 1586. https://doi.org/10.3390/ma19081586
APA StyleLi, M., Peng, Z., Zhang, D., Wang, X., Yang, W., Liang, Z., & Jiang, X. (2026). Van Der Waals Ferroionic CuInP2S6: Emergent Properties and Device Application. Materials, 19(8), 1586. https://doi.org/10.3390/ma19081586
