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Journal: MaterialsVolume: 18Number: 1903
Article: Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma
- Authors:
- Zaifeng Tang1,2,
- Yukun Lv2 and
- Kaiqu Ang2
- et al.
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