Next Article in Journal
Study of ZrO2 Gate Dielectric with Thin SiO2 Interfacial Layer in 4H-SiC Trench MOS Capacitors
Previous Article in Journal
Super High-k Dielectric via Composition-Dependent Hafnium Zirconium Oxide Superlattice for Si Nanosheet Gate-All-Around Field-Effect Transistors with NH3 Plasma-Optimized Interfaces
 
 

Order Article Reprints

Journal: Materials, 2025
Volume: 18
Number: 1742

Article: As-Casting Structure and Homogenization Behavior of Ta-Containing GH4151 Ni-Based Superalloy
Authors: by Tianliang Cui, Xingfei Xie, Wugang Yu, Jinglong Qu, Shaomin Lyu and Jinhui Du
Link: https://www.mdpi.com/1996-1944/18/8/1742

MDPI offers high quality article reprints with convenient shipping to destinations worldwide. Each reprint features a 270 gsm bright white cover and 105 gsm premium white paper, bound with two stitches for durability and printed in full color. The cover design is customized to your article and designed to be complimentary to the journal.

Order Cost and Details

Shipping Address

Billing Address

Notes or Comments

Validate and Place Order

The order must be prepaid after it is placed

req denotes required fields.
Back to TopTop