Sun, P.; Hu, X.; Xu, C.; Wang, L.; Wang, J.; Li, H.
Coupling Model of Electrolytic Proportion and Overcutting Depth in the Construction of Electrolytic Grinding Honeycomb Sealing Faces. Materials 2025, 18, 4783.
https://doi.org/10.3390/ma18204783
AMA Style
Sun P, Hu X, Xu C, Wang L, Wang J, Li H.
Coupling Model of Electrolytic Proportion and Overcutting Depth in the Construction of Electrolytic Grinding Honeycomb Sealing Faces. Materials. 2025; 18(20):4783.
https://doi.org/10.3390/ma18204783
Chicago/Turabian Style
Sun, Peng, Xiaoyun Hu, Chenyan Xu, Lu Wang, Jinhao Wang, and Hansong Li.
2025. "Coupling Model of Electrolytic Proportion and Overcutting Depth in the Construction of Electrolytic Grinding Honeycomb Sealing Faces" Materials 18, no. 20: 4783.
https://doi.org/10.3390/ma18204783
APA Style
Sun, P., Hu, X., Xu, C., Wang, L., Wang, J., & Li, H.
(2025). Coupling Model of Electrolytic Proportion and Overcutting Depth in the Construction of Electrolytic Grinding Honeycomb Sealing Faces. Materials, 18(20), 4783.
https://doi.org/10.3390/ma18204783