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Journal: MaterialsVolume: 18Number: 4681
Article: The Influence of Reactive Ion Etching Chemistry on the Initial Resistance and Cycling Stability of Line-Type (Bridge) Phase-Change Memory Devices
  • Authors:
  • Abbas Espiari1,*,†,
  • Henriette Padberg2,† and
  • Alexander Kiehn1
  • et al.
Link: https://www.mdpi.com/1996-1944/18/20/4681

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