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Journal: Materials, 2025
Volume: 18
Number: 4417
Article:
Selective Etching of Multi-Stacked Epitaxial Si1-xGex on Si Using CF4/N2 and CF4/O2 Plasma Chemistries for 3D Device Applications
Authors:
by
Jihye Kim, Joosung Kang, Dongmin Yoon, U-in Chung and Dae-Hong Ko
Link:
https://www.mdpi.com/1996-1944/18/18/4417
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