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Journal: Materials, 2024
Volume: 17
Number: 679

Article: Polishing Mechanism of CMP 4H-SiC Crystal Substrate (0001) Si Surface Based on an Alumina (Al2O3) Abrasive
Authors: by Juntao Gong, Weilei Wang, Weili Liu and Zhitang Song
Link: https://www.mdpi.com/1996-1944/17/3/679

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