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Journal: Materials, 2024
Volume: 17
Number: 6241
6241
Article: Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma–Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture
Authors: by Changyong Oh, Myeong Woo Ju, Hojun Jeong, Jun Ho Song, Bo Sung Kim, Dae Gyu Lee and ChoongHo Cho
Link: https://www.mdpi.com/1996-1944/17/24/6241

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