Zhou, J.; Zhan, J.; Lv, B.; Guo, Y.; Jiang, B.
Deposition Contribution Rates and Simulation Model Refinement for Polysilicon Films Deposited by Large-Sized Tubular Low-Pressure Chemical Vapor Deposition Reactors. Materials 2024, 17, 5952.
https://doi.org/10.3390/ma17235952
AMA Style
Zhou J, Zhan J, Lv B, Guo Y, Jiang B.
Deposition Contribution Rates and Simulation Model Refinement for Polysilicon Films Deposited by Large-Sized Tubular Low-Pressure Chemical Vapor Deposition Reactors. Materials. 2024; 17(23):5952.
https://doi.org/10.3390/ma17235952
Chicago/Turabian Style
Zhou, Jicheng, Jianyong Zhan, Bowen Lv, Yan Guo, and Bingchun Jiang.
2024. "Deposition Contribution Rates and Simulation Model Refinement for Polysilicon Films Deposited by Large-Sized Tubular Low-Pressure Chemical Vapor Deposition Reactors" Materials 17, no. 23: 5952.
https://doi.org/10.3390/ma17235952
APA Style
Zhou, J., Zhan, J., Lv, B., Guo, Y., & Jiang, B.
(2024). Deposition Contribution Rates and Simulation Model Refinement for Polysilicon Films Deposited by Large-Sized Tubular Low-Pressure Chemical Vapor Deposition Reactors. Materials, 17(23), 5952.
https://doi.org/10.3390/ma17235952