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Journal: Materials, 2023
Volume: 16
Number: 2324

Article: Wet-Oxidation-Assisted Chemical Mechanical Polishing and High-Temperature Thermal Annealing for Low-Loss 4H-SiC Integrated Photonic Devices
Authors: by Xiaodong Shi, Yaoqin Lu, Didier Chaussende, Karsten Rottwitt and Haiyan Ou
Link: https://www.mdpi.com/1996-1944/16/6/2324

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