Dai, Y.; Feng, Z.; Zhong, K.; Tian, J.; Wu, G.; Liu, Q.; Wang, Z.; Hua, Y.; Liu, J.; Xu, H.;
et al. Highly Efficient and Exceptionally Durable Photooxidation Properties on Co3O4/g-C3N4 Surfaces. Materials 2023, 16, 3879.
https://doi.org/10.3390/ma16103879
AMA Style
Dai Y, Feng Z, Zhong K, Tian J, Wu G, Liu Q, Wang Z, Hua Y, Liu J, Xu H,
et al. Highly Efficient and Exceptionally Durable Photooxidation Properties on Co3O4/g-C3N4 Surfaces. Materials. 2023; 16(10):3879.
https://doi.org/10.3390/ma16103879
Chicago/Turabian Style
Dai, Yelin, Ziyi Feng, Kang Zhong, Jianfeng Tian, Guanyu Wu, Qing Liu, Zhaolong Wang, Yingjie Hua, Jinyuan Liu, Hui Xu,
and et al. 2023. "Highly Efficient and Exceptionally Durable Photooxidation Properties on Co3O4/g-C3N4 Surfaces" Materials 16, no. 10: 3879.
https://doi.org/10.3390/ma16103879
APA Style
Dai, Y., Feng, Z., Zhong, K., Tian, J., Wu, G., Liu, Q., Wang, Z., Hua, Y., Liu, J., Xu, H., & Zhu, X.
(2023). Highly Efficient and Exceptionally Durable Photooxidation Properties on Co3O4/g-C3N4 Surfaces. Materials, 16(10), 3879.
https://doi.org/10.3390/ma16103879