Kukli, K.; Aarik, L.; Vinuesa, G.; Dueñas, S.; Castán, H.; GarcÃa, H.; Kasikov, A.; Ritslaid, P.; Piirsoo, H.-M.; Aarik, J.
Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition. Materials 2022, 15, 877.
https://doi.org/10.3390/ma15030877
AMA Style
Kukli K, Aarik L, Vinuesa G, Dueñas S, Castán H, GarcÃa H, Kasikov A, Ritslaid P, Piirsoo H-M, Aarik J.
Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition. Materials. 2022; 15(3):877.
https://doi.org/10.3390/ma15030877
Chicago/Turabian Style
Kukli, Kaupo, Lauri Aarik, Guillermo Vinuesa, Salvador Dueñas, Helena Castán, Héctor GarcÃa, Aarne Kasikov, Peeter Ritslaid, Helle-Mai Piirsoo, and Jaan Aarik.
2022. "Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition" Materials 15, no. 3: 877.
https://doi.org/10.3390/ma15030877
APA Style
Kukli, K., Aarik, L., Vinuesa, G., Dueñas, S., Castán, H., GarcÃa, H., Kasikov, A., Ritslaid, P., Piirsoo, H.-M., & Aarik, J.
(2022). Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition. Materials, 15(3), 877.
https://doi.org/10.3390/ma15030877
