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Journal: Materials, 2022
Volume: 15
Number: 7863

Article: Kinetics of Catalyst-Free and Position-Controlled Low-Pressure Chemical Vapor Deposition Growth of VO2 Nanowire Arrays on Nanoimprinted Si Substrates
Authors: by Sergey V. Mutilin, Lyubov V. Yakovkina, Vladimir A. Seleznev and Victor Ya. Prinz
Link: https://www.mdpi.com/1996-1944/15/21/7863

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