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Sun M, Blasco R, Nwodo J, de la Mata M, Molina SI, Ajay A, Monroy E, Valdueza-Felip S, Naranjo FB. Comparison of the Material Quality of Al_xIn_1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering. Materials. 2022; 15(20):7373. https://doi.org/10.3390/ma15207373

Sun, Michael, Rodrigo Blasco, Julian Nwodo, María de la Mata, Sergio I. Molina, Akhil Ajay, Eva Monroy, Sirona Valdueza-Felip, and Fernando B. Naranjo. 2022. "Comparison of the Material Quality of Al_xIn_1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering" Materials 15, no. 20: 7373. https://doi.org/10.3390/ma15207373

Sun, M., Blasco, R., Nwodo, J., de la Mata, M., Molina, S. I., Ajay, A., Monroy, E., Valdueza-Felip, S., & Naranjo, F. B. (2022). Comparison of the Material Quality of Al_xIn_1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering. Materials, 15(20), 7373. https://doi.org/10.3390/ma15207373