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Journal: Materials, 2022
Volume: 15
Number: 5641

Article: Surface Morphology Evolution during Chemical Mechanical Polishing Based on Microscale Material Removal Modeling for Monocrystalline Silicon
Authors: by Jingjing Xia, Jun Yu, Siwen Lu, Qiushi Huang, Chun Xie and Zhanshan Wang
Link: https://www.mdpi.com/1996-1944/15/16/5641

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