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Journal: Materials, 2021
Volume: 14
Number: 849
849
Article: Radiation Tolerance and Charge Trapping Enhancement of ALD HfO₂/Al₂O₃ Nanolaminated Dielectrics
Authors: by Dencho Spassov, Albena Paskaleva, Elżbieta Guziewicz, Vojkan Davidović, Srboljub Stanković, Snežana Djorić-Veljković, Tzvetan Ivanov, Todor Stanchev and Ninoslav Stojadinović
Link: https://www.mdpi.com/1996-1944/14/4/849

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