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Journal: Materials, 2021
Volume: 14
Number: 6950
Article:
Application of Neon Ion Implantation to Generate Intermediate Energy Levels in the Band Gap of Boron-Doped Silicon as a Material for Photovoltaic Cells
Authors:
by
Paweł Węgierek and Justyna Pastuszak
Link:
https://www.mdpi.com/1996-1944/14/22/6950
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