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Journal: Materials, 2021
Volume: 14
Number: 6950

Article: Application of Neon Ion Implantation to Generate Intermediate Energy Levels in the Band Gap of Boron-Doped Silicon as a Material for Photovoltaic Cells
Authors: by Paweł Węgierek and Justyna Pastuszak
Link: https://www.mdpi.com/1996-1944/14/22/6950

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