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Journal: Materials, 2021
Volume: 14
Number: 6947
Article:
Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF4 Based Process Conditions
Authors:
by
Mario Moreno, Arturo Ponce, Arturo Galindo, Eduardo Ortega, Alfredo Morales, Javier Flores, Roberto Ambrosio, Alfonso Torres, Luis Hernandez, Hector Vazquez-Leal, Gilles Patriarche and Pere Roca i Cabarrocas
Link:
https://www.mdpi.com/1996-1944/14/22/6947
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