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Journal: Materials, 2021
Volume: 14
Number: 6947
6947
Article: Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF₄ Based Process Conditions
Authors: by Mario Moreno, Arturo Ponce, Arturo Galindo, Eduardo Ortega, Alfredo Morales, Javier Flores, Roberto Ambrosio, Alfonso Torres, Luis Hernandez, Hector Vazquez-Leal, Gilles Patriarche and Pere Roca i Cabarrocas
Link: https://www.mdpi.com/1996-1944/14/22/6947

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