Grzywacz, H.; Jenczyk, P.; Milczarek, M.; Michałowski, M.; Jarząbek, D.M.
Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography. Materials 2021, 14, 6639.
https://doi.org/10.3390/ma14216639
AMA Style
Grzywacz H, Jenczyk P, Milczarek M, Michałowski M, Jarząbek DM.
Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography. Materials. 2021; 14(21):6639.
https://doi.org/10.3390/ma14216639
Chicago/Turabian Style
Grzywacz, Hubert, Piotr Jenczyk, Michał Milczarek, Marcin Michałowski, and Dariusz M. Jarząbek.
2021. "Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography" Materials 14, no. 21: 6639.
https://doi.org/10.3390/ma14216639
APA Style
Grzywacz, H., Jenczyk, P., Milczarek, M., Michałowski, M., & Jarząbek, D. M.
(2021). Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography. Materials, 14(21), 6639.
https://doi.org/10.3390/ma14216639