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Journal: Materials, 2021
Volume: 14
Number: 5036
Article:
Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
Authors:
by
Chulhee Cho, Kwangho You, Sijun Kim, Youngseok Lee, Jangjae Lee and Shinjae You
Link:
https://www.mdpi.com/1996-1944/14/17/5036
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