Wojcieszak, D.; Mazur, M.; Pokora, P.; Wrona, A.; Bilewska, K.; Kijaszek, W.; Kotwica, T.; Posadowski, W.; Domaradzki, J.
Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content. Materials 2021, 14, 3797.
https://doi.org/10.3390/ma14143797
AMA Style
Wojcieszak D, Mazur M, Pokora P, Wrona A, Bilewska K, Kijaszek W, Kotwica T, Posadowski W, Domaradzki J.
Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content. Materials. 2021; 14(14):3797.
https://doi.org/10.3390/ma14143797
Chicago/Turabian Style
Wojcieszak, Damian, Michał Mazur, Patrycja Pokora, Adriana Wrona, Katarzyna Bilewska, Wojciech Kijaszek, Tomasz Kotwica, Witold Posadowski, and Jarosław Domaradzki.
2021. "Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content" Materials 14, no. 14: 3797.
https://doi.org/10.3390/ma14143797
APA Style
Wojcieszak, D., Mazur, M., Pokora, P., Wrona, A., Bilewska, K., Kijaszek, W., Kotwica, T., Posadowski, W., & Domaradzki, J.
(2021). Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content. Materials, 14(14), 3797.
https://doi.org/10.3390/ma14143797