Article Versions Notes

Dimić-Mišić K, Kostić M, Obradović B, Kuraica M, Kramar A, Imani M, Gane P. Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions. Materials. 2021; 14(13):3571. https://doi.org/10.3390/ma14133571

Dimić-Mišić, Katarina, Mirjana Kostić, Bratislav Obradović, Milorad Kuraica, Ana Kramar, Monireh Imani, and Patrick Gane. 2021. "Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions" Materials 14, no. 13: 3571. https://doi.org/10.3390/ma14133571

Dimić-Mišić, K., Kostić, M., Obradović, B., Kuraica, M., Kramar, A., Imani, M., & Gane, P. (2021). Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions. Materials, 14(13), 3571. https://doi.org/10.3390/ma14133571