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Journal: Materials, 2020
Volume: 13
Number: 4278

Article: The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O2/He Plasmas for Thermopile Devices
Authors: by Na Zhou, Junjie Li, Haiyang Mao, Hao Liu, Jinbiao Liu, Jianfeng Gao, Jinjuan Xiang, Yanpeng Hu, Meng Shi, Jiaxin Ju, Yuxiao Lei, Tao Yang, Junfeng Li and Wenwu Wang
Link: https://www.mdpi.com/1996-1944/13/19/4278

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