Article Versions Notes

Jung YC, Hwang SM, Le DN, Kondusamy ALN, Mohan J, Kim SW, Kim JH, Lucero AT, Ravichandran A, Kim HS, et al. Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source. Materials. 2020; 13(15):3387. https://doi.org/10.3390/ma13153387

Jung, Yong Chan, Su Min Hwang, Dan N. Le, Aswin L. N. Kondusamy, Jaidah Mohan, Sang Woo Kim, Jin Hyun Kim, Antonio T. Lucero, Arul Ravichandran, Harrison Sejoon Kim, and et al. 2020. "Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source" Materials 13, no. 15: 3387. https://doi.org/10.3390/ma13153387

Jung, Y. C., Hwang, S. M., Le, D. N., Kondusamy, A. L. N., Mohan, J., Kim, S. W., Kim, J. H., Lucero, A. T., Ravichandran, A., Kim, H. S., Kim, S. J., Choi, R., Ahn, J., Alvarez, D., Spiegelman, J., & Kim, J. (2020). Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source. Materials, 13(15), 3387. https://doi.org/10.3390/ma13153387