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Atmospheric Pressure Plasma Deposition of TiO2: A Review

1
Radiation Laboratory, University of Notre Dame, Notre Dame, IN 46556, USA
2
Department of Physics, University of Notre Dame, Notre Dame, IN 46556, USA
*
Author to whom correspondence should be addressed.
Materials 2020, 13(13), 2931; https://doi.org/10.3390/ma13132931
Received: 4 June 2020 / Revised: 22 June 2020 / Accepted: 26 June 2020 / Published: 30 June 2020
(This article belongs to the Special Issue Atmospheric Pressure Plasmas in Material Science)
Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field. View Full-Text
Keywords: atmospheric pressure plasma; titanium dioxide; thin film deposition atmospheric pressure plasma; titanium dioxide; thin film deposition
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MDPI and ACS Style

Banerjee, S.; Adhikari, E.; Sapkota, P.; Sebastian, A.; Ptasinska, S. Atmospheric Pressure Plasma Deposition of TiO2: A Review. Materials 2020, 13, 2931.

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