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Journal: Materials, 2019
Volume: 12
Number: 1056

Article: High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
Authors: by Ava Khosravi, Rafik Addou, Massimo Catalano, Jiyoung Kim and Robert M. Wallace
Link: https://www.mdpi.com/1996-1944/12/7/1056

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