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Open AccessArticle

Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

1
Department of Chemistry-Ångström, Uppsala University, SE-75120 Uppsala, Sweden
2
Institute of Materials Science and Technology, TU Wien, A-1060 Wien, Austria
*
Author to whom correspondence should be addressed.
Materials 2019, 12(4), 587; https://doi.org/10.3390/ma12040587
Received: 21 January 2019 / Revised: 8 February 2019 / Accepted: 13 February 2019 / Published: 15 February 2019
(This article belongs to the Special Issue High Entropy Materials: From Fundamentals to Applications)
In this study, we show that the phase formation of HfNbTiVZr high-entropy thin films is strongly influenced by the substrate temperature. Films deposited at room temperature exhibit an amorphous microstructure and are 6.5 GPa hard. With increasing substrate temperature (room temperature to 275 °C), a transition from an amorphous to a single-phased body-centred cubic (bcc) solid solution occurs, resulting in a hardness increase to 7.9 GPa. A higher deposition temperature (450 °C) leads to the formation of C14 or C15 Laves phase precipitates in the bcc matrix and a further enhancement of mechanical properties with a peak hardness value of 9.2 GPa. These results also show that thin films follow different phase formation pathways compared to HfNbTiVZr bulk alloys. View Full-Text
Keywords: high-entropy alloys; physical vapour deposition (PVD); metallic glass high-entropy alloys; physical vapour deposition (PVD); metallic glass
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Fritze, S.; Koller, C.M.; von Fieandt, L.; Malinovskis, P.; Johansson, K.; Lewin, E.; Mayrhofer, P.H.; Jansson, U. Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films. Materials 2019, 12, 587.

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