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Journal: Materials, 2019
Volume: 12
Number: 406

Article: Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
Authors: by Heli Seppänen, Iurii Kim, Jarkko Etula, Evgeniy Ubyivovk, Alexei Bouravleuv and Harri Lipsanen
Link: https://www.mdpi.com/1996-1944/12/3/406

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