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Improvement of Thermal Cycling Resistance of AlxSi1−xN Coatings on Cu Substrates by Optimizing Al/Si Ratio

1
Institute of Strength Physics and Materials Science of Siberian Branch of Russian Academy of Sciences, 634055 Tomsk, Russia
2
School of Nuclear Science & Engineering, National Research Tomsk Polytechnic University, 634050 Tomsk, Russia
*
Author to whom correspondence should be addressed.
Materials 2019, 12(14), 2249; https://doi.org/10.3390/ma12142249
Received: 18 June 2019 / Revised: 8 July 2019 / Accepted: 10 July 2019 / Published: 12 July 2019
(This article belongs to the Special Issue Deformation and Fracture of Thin Films and Nanostructured Materials)
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Abstract

The effect of the elemental composition of AlxSi1−xN coatings deposited on Cu substrates by magnetron sputtering on their structure, mechanical properties and thermal cycling performance is studied. The coatings with Al-Si-N solid solution, two-phase (AlxSi1−xN nanocrystallites embedded in the SixNy tissue phase) and amorphous structure were obtained by varying Al/Si ratio. It is shown that polycrystalline coatings with a low Si content (Al0.88Si0.12N) are characterized by the highest thermal cycling resistance. While the coatings with a high and intermediate Si content (Al0.11Si0.89N and Al0.74Si0.26N) were subjected to cracking and spallation after the first cycle of annealing at a temperature of 1000 °C, delamination of the Al0.88Si0.12N coating was observed after 25 annealing cycles. The Al0.88Si0.12N coating also exhibited the best barrier performance against copper diffusion from the substrate. The effect of thermal stresses on the diffusion barrier performance of the coatings against copper diffusion is discussed. View Full-Text
Keywords: AlxSi1−xN coatings; copper; magnetron sputtering; thermal cycling performance; scanning electron microscopy; cracking AlxSi1−xN coatings; copper; magnetron sputtering; thermal cycling performance; scanning electron microscopy; cracking
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Panin, A.; Shugurov, A.; Kazachenok, M.; Sergeev, V. Improvement of Thermal Cycling Resistance of AlxSi1−xN Coatings on Cu Substrates by Optimizing Al/Si Ratio. Materials 2019, 12, 2249.

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