Next Article in Journal
Biocompatible/Biodegradable Electrowetting on Dielectric Microfluidic Chips with Fluorinated CTA/PLGA
Next Article in Special Issue
29Si NMR Chemical Shifts in Crystalline and Amorphous Silicon Nitrides
Previous Article in Journal
Accelerating High-Throughput Screening for Structural Materials with Production Management Methods
Open AccessFeature PaperReview

Determining the Nitrogen Content in (Oxy)Nitride Materials

Univ. Rennes, CNRS, ISCR (Institut des Sciences Chimiques de Rennes)—UMR 6226, F-35000 Rennes, France
Materials 2018, 11(8), 1331;
Received: 19 June 2018 / Revised: 28 July 2018 / Accepted: 30 July 2018 / Published: 1 August 2018
(This article belongs to the Special Issue Nitride Ceramics: Synthesis, Properties and Applications)
Nitrogen (and also oxygen) determination has become an important parameter to characterize (oxy)nitride materials for many properties and applications. Analyzing such anions with accuracy is still a challenge for some materials. However, to date, a large panel of methodologies is available to answer this issue with relevant results, even for thin films. Carrier gas hot extraction techniques and electron probe microanalysis with wavelength dispersive spectroscopy (EPMA-WDS) look attractive to analyze bulk materials and thin films, respectively. This paper gathers several techniques using chemical and physical routes to access such anionic contents. Limitations and problems are pointed out for both powders and films. View Full-Text
Keywords: nitrogen analysis; (oxy)nitride; powder; thin films nitrogen analysis; (oxy)nitride; powder; thin films
Show Figures

Figure 1

MDPI and ACS Style

Tessier, F. Determining the Nitrogen Content in (Oxy)Nitride Materials. Materials 2018, 11, 1331.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

Back to TopTop