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Open AccessArticle

Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching

1
Institute of Electro-Optical and Material Science, National Formosa University, 63201 Yunlin, Taiwan
2
Additive Manufacturing and Laser Application, Industrial Technology Research Institute, 73445 Tainan, Taiwan
3
Metal Industries Research & Development Centre, 82151 Kaohsiung, Taiwan
*
Author to whom correspondence should be addressed.
Materials 2018, 11(7), 1089; https://doi.org/10.3390/ma11071089
Received: 30 May 2018 / Revised: 24 June 2018 / Accepted: 25 June 2018 / Published: 26 June 2018
(This article belongs to the Special Issue Selected Papers from IEEE ICASI 2018)
In this work, the surface morphology of a hydrophobic organosilicon film was modified as it was deposited onto a silver seed layer with nanoparticles. The surface hydrophobicity evaluated by the water contact angle was significantly increased from 100° to 128° originating from the surface of the organosilicon film becoming roughened, and was deeply relevant to the Ag seed layer conform deposition. In addition, the organosilicon film became surface oleophobic and the surface hydrophobicity was improved due to the formation of the inactive C-F chemical on the surface after the carbon tetrafluoride glow discharge etching. The surface hydrophobicity and oleophobicity of the organosilicon film could be further optimized with water and oleic contact angles of about 138° and 61°, respectively, after an adequate fluorination etching. View Full-Text
Keywords: organosilicon film; silver seed layer; conformity deposition; hydrophobicity; oleophobicity; fluorination etching organosilicon film; silver seed layer; conformity deposition; hydrophobicity; oleophobicity; fluorination etching
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MDPI and ACS Style

Xu, Z.-W.; Zhang, Y.-K.; Chen, T.-H.; Chang, J.-H.; Lee, T.-H.; Li, P.-Y.; Liu, D.-S. Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching. Materials 2018, 11, 1089.

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