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Multi-Aperture Shower Design for the Improvement of the Transverse Uniformity of MOCVD-Derived GdYBCO Films

State Key Lab of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
School of Physical Science and Technology, Southwest Jiaotong University, Chengdu 610031, China
Chengdu Fine Optical Engineering Research Center, Chengdu 610041, China
School of Physics, Shanghai University, Shanghai 200444, China
Author to whom correspondence should be addressed.
Materials 2017, 10(9), 1088;
Received: 14 August 2017 / Revised: 6 September 2017 / Accepted: 13 September 2017 / Published: 15 September 2017
A multi-aperture shower design is reported to improve the transverse uniformity of GdYBCO superconducting films on the template of sputtered-LaMnO3/epitaxial-MgO/IBAD-MgO/solution deposition planarization (SDP)-Y2O3-buffered Hastelloy tapes. The GdYBCO films were prepared by the metal organic chemical vapor deposition (MOCVD) process. The transverse uniformities of structure, morphology, thickness, and performance were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), step profiler, and the standard four-probe method using the criteria of 1 μV/cm, respectively. Through adopting the multi-aperture shower instead of the slit shower, measurement by step profiler revealed that the thickness difference between the middle and the edges based on the slit shower design was well eliminated. Characterization by SEM showed that a GdYBCO film with a smooth surface was successfully prepared. Moreover, the transport critical current density (Jc) of its middle and edge positions at 77 K and self-field were found to be over 5 MA/cm2 through adopting the micro-bridge four-probe method. View Full-Text
Keywords: multi-aperture shower; GdYBCO; MOCVD; morphology; critical current multi-aperture shower; GdYBCO; MOCVD; morphology; critical current
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Zhao, R.; Liu, Q.; Xia, Y.; Zhang, F.; Lu, Y.; Cai, C.; Tao, B.; Li, Y. Multi-Aperture Shower Design for the Improvement of the Transverse Uniformity of MOCVD-Derived GdYBCO Films. Materials 2017, 10, 1088.

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