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Journal: Materials, 2017
Volume: 10
Number: 627

Article: Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment
Authors: by Jianping Li, Hailong Qin, Yongsheng Liu, Fang Ye, Zan Li, Laifei Cheng and Litong Zhang
Link: https://www.mdpi.com/1996-1944/10/6/627

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