Seifert, M.; Brachmann, E.; Rane, G.K.; Menzel, S.B.; Gemming, T.
Capability Study of Ti, Cr, W, Ta and Pt as Seed Layers for Electrodeposited Platinum Films on γ-Al2O3 for High Temperature and Harsh Environment Applications. Materials 2017, 10, 54.
https://doi.org/10.3390/ma10010054
AMA Style
Seifert M, Brachmann E, Rane GK, Menzel SB, Gemming T.
Capability Study of Ti, Cr, W, Ta and Pt as Seed Layers for Electrodeposited Platinum Films on γ-Al2O3 for High Temperature and Harsh Environment Applications. Materials. 2017; 10(1):54.
https://doi.org/10.3390/ma10010054
Chicago/Turabian Style
Seifert, Marietta, Erik Brachmann, Gayatri K. Rane, Siegfried B. Menzel, and Thomas Gemming.
2017. "Capability Study of Ti, Cr, W, Ta and Pt as Seed Layers for Electrodeposited Platinum Films on γ-Al2O3 for High Temperature and Harsh Environment Applications" Materials 10, no. 1: 54.
https://doi.org/10.3390/ma10010054
APA Style
Seifert, M., Brachmann, E., Rane, G. K., Menzel, S. B., & Gemming, T.
(2017). Capability Study of Ti, Cr, W, Ta and Pt as Seed Layers for Electrodeposited Platinum Films on γ-Al2O3 for High Temperature and Harsh Environment Applications. Materials, 10(1), 54.
https://doi.org/10.3390/ma10010054