Li, G.; Lin, W.; Liu, S.; Aileplanm, Y.; Du, A.; Li, L.
Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes. Sensors 2025, 25, 6974.
https://doi.org/10.3390/s25226974
AMA Style
Li G, Lin W, Liu S, Aileplanm Y, Du A, Li L.
Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes. Sensors. 2025; 25(22):6974.
https://doi.org/10.3390/s25226974
Chicago/Turabian Style
Li, Genzhuang, Wang Lin, Shishuai Liu, Yeldos Aileplanm, Aochen Du, and Liuan Li.
2025. "Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes" Sensors 25, no. 22: 6974.
https://doi.org/10.3390/s25226974
APA Style
Li, G., Lin, W., Liu, S., Aileplanm, Y., Du, A., & Li, L.
(2025). Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes. Sensors, 25(22), 6974.
https://doi.org/10.3390/s25226974