Article Versions Notes

Park H, Kim J, Cho S, Kim K, Jang S, Choi Y, Lee H. Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis. Sensors. 2024; 24(6):1786. https://doi.org/10.3390/s24061786

Park, Haewook, Juhyun Kim, Sungwon Cho, Kyunghyun Kim, Sungho Jang, Younsok Choi, and Hohyun Lee. 2024. "Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis" Sensors 24, no. 6: 1786. https://doi.org/10.3390/s24061786

Park, H., Kim, J., Cho, S., Kim, K., Jang, S., Choi, Y., & Lee, H. (2024). Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis. Sensors, 24(6), 1786. https://doi.org/10.3390/s24061786