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Kadono T, Hirose R, Onaka-Masada A, Kobayashi K, Suzuki A, Okuyama R, Koga Y, Fukuyama A, Kurita K. Reduction of White Spot Defects in CMOS Image Sensors Fabricated Using Epitaxial Silicon Wafer with Proximity Gettering Sinks by CH₂P Molecular Ion Implantation. Sensors. 2022; 22(21):8258. https://doi.org/10.3390/s22218258

Kadono, Takeshi, Ryo Hirose, Ayumi Onaka-Masada, Koji Kobayashi, Akihiro Suzuki, Ryosuke Okuyama, Yoshihiro Koga, Atsuhiko Fukuyama, and Kazunari Kurita. 2022. "Reduction of White Spot Defects in CMOS Image Sensors Fabricated Using Epitaxial Silicon Wafer with Proximity Gettering Sinks by CH₂P Molecular Ion Implantation" Sensors 22, no. 21: 8258. https://doi.org/10.3390/s22218258

Kadono, T., Hirose, R., Onaka-Masada, A., Kobayashi, K., Suzuki, A., Okuyama, R., Koga, Y., Fukuyama, A., & Kurita, K. (2022). Reduction of White Spot Defects in CMOS Image Sensors Fabricated Using Epitaxial Silicon Wafer with Proximity Gettering Sinks by CH₂P Molecular Ion Implantation. Sensors, 22(21), 8258. https://doi.org/10.3390/s22218258