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Journal: Sensors, 2022
Volume: 22
Number: 8258

Article: Reduction of White Spot Defects in CMOS Image Sensors Fabricated Using Epitaxial Silicon Wafer with Proximity Gettering Sinks by CH2P Molecular Ion Implantation
Authors: by Takeshi Kadono, Ryo Hirose, Ayumi Onaka-Masada, Koji Kobayashi, Akihiro Suzuki, Ryosuke Okuyama, Yoshihiro Koga, Atsuhiko Fukuyama and Kazunari Kurita
Link: https://www.mdpi.com/1424-8220/22/21/8258

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